Precision Humidity Control System

Humidity sensor can be optionally installed inside the all chambers of Micro Probe System.
The Precision Humidity Control System consists of a two-channel MFC, DI water bubbling bath and humidity control software.
Precise control of relative humidity can be quickly achieved PID control method.

General Specification
Manufacturer Nextron Corporation
Product Name Precision Humidity Control System
Model Number HCS-2MPT (for PT, LN models)
HCS-2MCH (for CH models)
Dimensions W 300 mm
D 180 mm
H 355 mm
Weight 7.5 kg
Input Power 100 - 240 VAC, 50/60 Hz
External Port Communication Interface USB 2.0 Type B
Gas Flow Inlet / Outlet Swagelok tube fitting ¼“
Number of MFC Unit 2 ea
Technical Information
Carrier Gas N2 (recommanded), Air, Ar
Bubbling Bath Volume 200 cc
Total Flow Rate 1000 SCCM*
Gas Flow Range 0 - 1000 SCCM**
Flow Rate Accuracy ±2 % of full scale
Humidity Control Range 4 - 95 %RH***
Typical Accuracy of Humidity 2 %RH (@ 1 - 97 %RH)
Normal Ramp Speed 10 %RH / min
RH Resolution 0.1 %RH
Recommended Pressure of Gas Inlet 10 - 40 psig
Required Power 24 VA MAX
Communication type USB Communication

*Total flow rate can be selected from 100 to 1000 SCCM.
**Flow Range is determined by total flow rate.
***Ranges may differ depending on experimentation and laboratory temperature.

Dimension

(Unit: mm)
humidity controller's dimension top view
humidity controller's dimension 3D view
Top 3D
humidity controller's dimension front view
humidity controller's dimension right view
Front Right

Diagram

Humidity controller's diagram

Technical Data

Humidity controller's data

Technical Data

Humidity controller's application1

Figure. (a) Schematic diagram of the custom-made early detection of pipeline leak etection system consisting of PtSe2 nanograin-based humidity sensor, (b) precise detection of input humidity pulses by the PtSe2-based humidity sensor, (c) response of best-in-class reference humidity sensor for comparison.

Technical Data

Humidity controller's application2

Figure. IV characteristics of ε-Ga2O3 layers when exposed to different concentrations of (a) H2, (b) NO2, (c) O2, and (d) CO.